Author: Turro, Nicholas J. / Academic Unit: Chemistry | Search Results

1. Solid phase modular synthesis of polymacromer brushes and their isolation as molecular products by photocleavage from the substrate

: Dach, Benjamin Isaac; Li, Xia; Turro, Nicholas J.; Koberstein, Jeffrey T.
: 2011
: Articles
: ChemistryChemical engineering

2. Adiabatic ring opening in tethered naphthalene and anthracene cycloadducts

: Sundaresan, Arun K.; Jockusch, Steffen; Li, Yongjun; Lancaster, Jeffrey R.; Banik, Steven; Zimmerman, Paul; Blackwell, James M.; Bristol, Robert; Turro, Nicholas J.
: 2010
: Articles
: ChemistryChemical engineering

3. A covalently linked phenanthridine-ruthenium(II) complex as a RNA probe

: O'Connor, Naphtali A.; Stevens, Nathan; Samaroo, Diana; Solomon, Marissa Rowanda; Martí, Angel A.; Dyer, Joanne; Vishwasrao, Harshad; Akins, Daniel L.; Kandel, Eric; Turro, Nicholas J.
: 2009
: Articles
: ChemistryChemical engineering

4. A New Materials-based Pitch Division Technique

: Gu, Xinyu; Bates, Christopher; Cho, Younjin; Costner, Elizabeth; Marzuka, Fernando; Nagai, Tomoki; Ogata, Toshiyuki; Shi, Chuan; Sundaresan, Arun K.; Turro, Nicholas J.; Bristol, Robert; Zimmerman, Paul; Willson, C. Grant
: 2009
: Articles
: ChemistryChemical engineering

5. Coupled translation-rotation eigenstates of H2 in C60 and C70 on the spectroscopically optimized interaction potential: Effects of cage anisotropy on the energy level structure and assignments

: Xu, Minzhong; Sebastianelli, Francesco; Gibbons, Brittney R.; Bačić, Zlatko; Lawler, Ronald; Turro, Nicholas J.
: 2009
: Articles
: Chemical engineeringChemistry

6. Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography

: Gu, Xinyu; Berro, Adam J.; Cho, Younjin; Jen, Kane; Lee, Saul; Nagai, Tomoki; Ogata, Toshiyuki; Durand, William J.; Sundaresan, Arun K.; Lancaster, Jeffrey R.; Jockusch, Steffen; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant
: 2009
: Articles
: ChemistryChemical engineering

7. Materials modeling and development for use in double-exposure lithography applications

: Lee, Saul; Jen, Kane; Willson, C. Grant; Byers, Jeffrey; Zimmerman, Paul; Turro, Nicholas J.
: 2009
: Articles
: ChemistryChemical engineering

8. Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography

: Berro, Adam J.; Gu, Xinyu; O'Connor, Naphtali; Jockusch, Steffen; Nagai, Tomoki; Ogata, Toshiyuki; Zimmerman, Paul; Rice, Bryan J.; Adolph, Elizabeth; Byargeon, Travis; Gonzalez, Jose; Turro, Nicholas J.; Willson, C. Grant
: 2009
: Articles
: ChemistryChemical engineering

9. Physical and chemical quenching rates and their influence on stereoselective photooxygenation of oxazolidinone-functionalized enecarbamates

: Solomon, Marissa Rowanda; Sivaguru, J.; Adam, Waldemar; Jockusch, Steffen; Turro, Nicholas J.
: 2009
: Articles
: ChemistryChemical engineering

10. Polyurethane Nanocomposites

: Khudyakov, Igor V.; Zopf, R. David; Turro, Nicholas J.
: 2009
: Articles
: ChemistryChemical engineering

11. Probing the photoreactivity of aryl chlorides with oxygen

: Da Silva, José P.; Jockusch, Steffen; Turro, Nicholas J.
: 2009
: Articles
: ChemistryChemical engineering

12. Shedding light on surfaces: using photons to transform and pattern material surfaces

: Park, Ellane J.; Carroll, Gregory T.; Turro, Nicholas J.; Koberstein, Jeffrey T.
: 2009
: Articles
: ChemistryChemical engineering

13. An analysis of double exposure lithography options

: Lee, Saul; Byers, Jeffrey; Jen, Kane; Zimmerman, Paul; Rice, Bryan; Turro, Nicholas J.; Willson, C. Grant
: 2008
: Articles
: ChemistryChemical engineering

14. Copper-free click chemistry for the in situ crosslinking of photodegradable star polymers

: Johnson, Jeremiah; Baskin, Jeremy M.; Bertozzi, Carolyn R.; Koberstein, Jeffrey T.; Turro, Nicholas J.
: 2008
: Articles
: Chemical engineeringChemistry

15. Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193 nm

: O'Connor, Naphtali A.; Liberman, Vladimir; Lei, Xuegong; López-Gejo, Juan; Turro, Nicholas J.; Zimmerman, Paul A.
: 2008
: Articles
: ChemistryChemical engineering

16. Development and Evaluation of a 193nm Immersion Generation-Three Fluid Candidates

: Zimmerman, Paul A.; Byers, Jeff; Rice, Bryan; Ober, Christopher K.; Giannelis, Emmanuel P.; Rodriguez, Robert; Wang, Dongyan; O'Connor, Naphtali; Lei, Xuegong; Turro, Nicholas J.; Liberman, Vladimir; Palmacci, Stephen; Rothschild, Mordechai; Lafferty, Neal; Smith, Bruce W.
: 2008
: Articles
: ChemistryChemical engineering

17. Dynamic properties and optical phase conjugation of two-photon pumped ultrashort blue stimulated emission in a chromophore solution

: He, Guang S.; Qin, Hai-Yan; Zheng, Qingdong; Prasad, Paras N.; Jockusch, Steffen; Turro, Nicholas J.; Halim, Marlin; Sames, Dalibor; Ågren, Hans; He, Sailing
: 2008
: Articles
: Chemical engineeringChemistry

18. H2, HD, and D2 inside C60: Coupled translation-rotation eigenstates of the endohedral molecules from quantum five-dimensional calculations

: Xu, Minzhong; Sebastianelli, Francesco; Bačić, Zlatko; Lawler, Ronald; Turro, Nicholas J.
: 2008
: Articles
: Chemical engineeringChemistry

19. Quantum dynamics of coupled translational and rotational motions of H2 inside C60

: Xu, Minzhong; Sebastianelli, Francesco; Gibbons, Brittney R.; Bačić, Zlatko; Lawler, Ronald; Turro, Nicholas J.
: 2008
: Articles
: Chemical engineeringChemistry

20. Singlet molecular oxygen by direct excitation

: Jockusch, Steffen; Turro, Nicholas J.; Thompson, Elizabeth K.; Gouterman, Martin; Callis, James B.; Khalil, Gamal E.
: 2008
: Articles
: Chemical engineeringChemistry

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1. Solid phase modular synthesis of polymacromer brushes and their isolation as molecular products by photocleavage from the substrate

2. Adiabatic ring opening in tethered naphthalene and anthracene cycloadducts

3. A covalently linked phenanthridine-ruthenium(II) complex as a RNA probe

4. A New Materials-based Pitch Division Technique

5. Coupled translation-rotation eigenstates of H2 in C60 and C70 on the spectroscopically optimized interaction potential: Effects of cage anisotropy on the energy level structure and assignments

6. Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography

7. Materials modeling and development for use in double-exposure lithography applications

8. Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography

9. Physical and chemical quenching rates and their influence on stereoselective photooxygenation of oxazolidinone-functionalized enecarbamates

10. Polyurethane Nanocomposites

11. Probing the photoreactivity of aryl chlorides with oxygen

12. Shedding light on surfaces: using photons to transform and pattern material surfaces

13. An analysis of double exposure lithography options

14. Copper-free click chemistry for the in situ crosslinking of photodegradable star polymers

15. Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193 nm

16. Development and Evaluation of a 193nm Immersion Generation-Three Fluid Candidates

17. Dynamic properties and optical phase conjugation of two-photon pumped ultrashort blue stimulated emission in a chromophore solution

18. H2, HD, and D2 inside C60: Coupled translation-rotation eigenstates of the endohedral molecules from quantum five-dimensional calculations

19. Quantum dynamics of coupled translational and rotational motions of H2 inside C60

20. Singlet molecular oxygen by direct excitation

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Search Results

1. Solid phase modular synthesis of polymacromer brushes and their isolation as molecular products by photocleavage from the substrate

2. Adiabatic ring opening in tethered naphthalene and anthracene cycloadducts

3. A covalently linked phenanthridine-ruthenium(II) complex as a RNA probe

4. A New Materials-based Pitch Division Technique

5. Coupled translation-rotation eigenstates of H2 in C60 and C70 on the spectroscopically optimized interaction potential: Effects of cage anisotropy on the energy level structure and assignments

6. Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography

7. Materials modeling and development for use in double-exposure lithography applications

8. Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography

9. Physical and chemical quenching rates and their influence on stereoselective photooxygenation of oxazolidinone-functionalized enecarbamates

10. Polyurethane Nanocomposites

11. Probing the photoreactivity of aryl chlorides with oxygen

12. Shedding light on surfaces: using photons to transform and pattern material surfaces

13. An analysis of double exposure lithography options

14. Copper-free click chemistry for the in situ crosslinking of photodegradable star polymers

15. Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193 nm

16. Development and Evaluation of a 193nm Immersion Generation-Three Fluid Candidates

17. Dynamic properties and optical phase conjugation of two-photon pumped ultrashort blue stimulated emission in a chromophore solution

18. H2, HD, and D2 inside C60: Coupled translation-rotation eigenstates of the endohedral molecules from quantum five-dimensional calculations

19. Quantum dynamics of coupled translational and rotational motions of H2 inside C60

20. Singlet molecular oxygen by direct excitation