1. Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography Berro, Adam J.; Gu, Xinyu; O'Connor, Naphtali; Jockusch, Steffen; Nagai, Tomoki; Ogata, Toshiyuki; Zimmerman, Paul; Rice, Bryan J.; Adolph, Elizabeth; Byargeon, Travis; Gonzalez, Jose; Turro, Nicholas J.; Willson, C. Grant 2009 Articles ChemistryChemical engineering
2. Development and Evaluation of a 193nm Immersion Generation-Three Fluid Candidates Zimmerman, Paul A.; Byers, Jeff; Rice, Bryan; Ober, Christopher K.; Giannelis, Emmanuel P.; Rodriguez, Robert; Wang, Dongyan; O'Connor, Naphtali; Lei, Xuegong; Turro, Nicholas J.; Liberman, Vladimir; Palmacci, Stephen; Rothschild, Mordechai; Lafferty, Neal; Smith, Bruce W. 2008 Articles ChemistryChemical engineering