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1. Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography

Berro, Adam J.; Gu, Xinyu; O'Connor, Naphtali; Jockusch, Steffen; Nagai, Tomoki; Ogata, Toshiyuki; Zimmerman, Paul; Rice, Bryan J.; Adolph, Elizabeth; Byargeon, Travis; Gonzalez, Jose; Turro, Nicholas J.; Willson, C. Grant
2009
Articles
ChemistryChemical engineering