1. 157 nm Pellicles for Photolithography: Mechanistic Investigation of the Deep UV Photolysis of Fluorocarbons Lee, Kwangjoo; Jockusch, Steffen; Turro, Nicholas J.; French, Roger H.; Wheland, Robert C.; Lemon, Michael F.; Braun, Andre M.; Widerschpan, Tatjana; Zimmerman, Paul 2004 Articles ChemistryChemical engineering