Status of High-Index Materials for Generation-Three 193nm Immersion Lithography
Generation-three (Gen-3) immersion lithography can be an enabler for the 32nm half-pitch node. For Gen-3 lithography to be successful, however, there must be three major breakthroughs in materials development: high refractive index ("high-index") lenses, high-index immersion fluids, and high-index photo-resists. Currently a material for a high-index lens element, lutetium aluminum garnet (LuAG), has been identified. However, suitable materials choices remain elusive for both the Gen-3 fluid and resist. This paper reviews the successes and failures in the search for Gen-3 high-index materials.
- NJT828.pdf application/pdf 912 KB Download File
- Published In
- Journal of Photopolymer Science and Technology
- 643 - 650
- Academic Units