Academic Commons

Articles

Status of High-Index Materials for Generation-Three 193nm Immersion Lithography

Zimmerman, Paul A.; Peski, Chris van; Rice, Bryan; Byers, Jeff; Turro, Nicholas J.; Lei, Xuegong; López-Gejo, Juan; Liberman, Vladimir; Palmacci, Steve; Rothchild, Mordy; Whitker, Andrew; Blakey, Idriss; Chen, Lan; Dargaville, Bronwin; Liu, Heping

Generation-three (Gen-3) immersion lithography can be an enabler for the 32nm half-pitch node. For Gen-3 lithography to be successful, however, there must be three major breakthroughs in materials development: high refractive index ("high-index") lenses, high-index immersion fluids, and high-index photo-resists. Currently a material for a high-index lens element, lutetium aluminum garnet (LuAG), has been identified. However, suitable materials choices remain elusive for both the Gen-3 fluid and resist. This paper reviews the successes and failures in the search for Gen-3 high-index materials.

Files

More Information

Published In
Journal of Photopolymer Science and Technology
Volume
20
Issue
5
Pages
643 - 650
Academic Units
Chemistry
Academic Commons provides global access to research and scholarship produced at Columbia University, Barnard College, Teachers College, Union Theological Seminary and Jewish Theological Seminary. Academic Commons is managed by the Columbia University Libraries.