Precision Tuning of Silicon Nanophotonic Devices through Post-Fabrication Processes
- Precision Tuning of Silicon Nanophotonic Devices through Post-Fabrication Processes
- Chen, Charlton J.
- Thesis Advisor(s):
- Wong, Chee Wei
Im, James Sungbin
- Ph.D., Columbia University
- Applied Physics and Applied Mathematics
- Persistent URL:
- This thesis investigates ways of improving the performance of fundamental silicon nanophotonic devices through post-fabrication processes. These devices include numerous optical resonator designs as well as slow-light waveguides. Optical resonators are used to confine photons both spatially and temporally. In recent years, there has been much research, both theoretical and experimental, into improving the design of optical resonators. Improving these devices through fabrication processes has generally been less studied. Optical waveguides are used to guide the flow of photons over chip-level distances. Slow-light waveguides have also been studied by many research groups in recent years and can applied to an increasingly wide-range of applications. The work can be divided into several parts: Chapter 1 is an introduction to the field of silicon photonics as well as an overview of the fabrication, experimental and computational techniques used throughout this work. Chapters 2, 3 and 4 describe our investigations into the precision tuning of nanophotonic devices using laser-assisted oxidation and atomic layer deposition. Chapters 5 and 6 describe our investigations into improving the sidewall roughness of silicon photonic devices using hydrogen annealing and excimer laser induced melting. Finally, Chapter 7 describes our investigations into the nonlinear properties of lead chalcogenide nanocrystals.
- Item views
text | xml
- Suggested Citation:
- Charlton J. Chen, 2011, Precision Tuning of Silicon Nanophotonic Devices through Post-Fabrication Processes, Columbia University Academic Commons, https://doi.org/10.7916/D8MS40QG.