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31 Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography

Author(s):
Gu, Xinyu; Berro, Adam J.; Cho, Younjin; Jen, Kane; Lee, Saul; Nagai, Tomoki; Ogata, Toshiyuki; Durand, William J.; Sundaresan, Arun K.; Lancaster, Jeffrey R.; Jockusch, Steffen; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9348

32 Materials modeling and development for use in double-exposure lithography applications

Author(s):
Lee, Saul; Jen, Kane; Willson, C. Grant; Byers, Jeffrey; Zimmerman, Paul; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9347

33 Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography

Author(s):
Berro, Adam J.; Gu, Xinyu; O'Connor, Naphtali; Jockusch, Steffen; Nagai, Tomoki; Ogata, Toshiyuki; Zimmerman, Paul; Rice, Bryan J.; Adolph, Elizabeth; Byargeon, Travis; Gonzalez, Jose; Turro, Nicholas J.; Willson, C. Grant
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9349

34 Physical and chemical quenching rates and their influence on stereoselective photooxygenation of oxazolidinone-functionalized enecarbamates

Author(s):
Solomon, Marissa Rowanda; Sivaguru, J.; Adam, Waldemar; Jockusch, Steffen; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8596

35 Polyurethane Nanocomposites

Author(s):
Khudyakov, Igor V.; Zopf, R. David; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9367

36 Probing the photoreactivity of aryl chlorides with oxygen

Author(s):
José P. da, Silva; Jockusch, Steffen; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8595

37 Shedding light on surfaces—using photons to transform and pattern material surfaces

Author(s):
Park, Ellane J.; Carroll, Gregory T.; Turro, Nicholas J.; Koberstein, Jeffrey T.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8594

38 An analysis of double exposure lithography options

Author(s):
Lee, Saul; Byers, Jeffrey; Jen, Kane; Zimmerman, Paul; Rice, Bryan; Turro, Nicholas J.; Willson, C. Grant
Date:
2008
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9351

39 Copper-free click chemistry for the in situ crosslinking of photodegradable star polymers

Author(s):
Johnson, Jeremiah; Baskin, Jeremy M.; Bertozzi, Carolyn R.; Koberstein, Jeffrey T.; Turro, Nicholas J.
Date:
2008
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8599

40 Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193 nm

Author(s):
O'Connor, Naphtali A.; Liberman, Vladimir; Lei, Xuegong; López-Gejo, Juan; Turro, Nicholas J.; Zimmerman, Paul A.
Date:
2008
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9355

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