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1 Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193 nm

Author(s):
O'Connor, Naphtali A.; Liberman, Vladimir; Lei, Xuegong; López-Gejo, Juan; Turro, Nicholas J.; Zimmerman, Paul A.
Date:
2008
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9355

2 Development and Evaluation of a 193nm Immersion Generation-Three Fluid Candidates

Author(s):
Zimmerman, Paul A.; Byers, Jeff; Rice, Bryan; Ober, Christopher K.; Giannelis, Emmanuel P.; Rodriguez, Robert; Wang, Dongyan; O'Connor, Naphtali; Lei, Xuegong; Turro, Nicholas J.; Liberman, Vladimir; Palmacci, Stephen; Rothschild, Mordechai; Lafferty, Neal; Smith, Bruce W.
Date:
2008
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9350

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