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Status of High-Index Materials for Generation-Three 193nm Immersion Lithography

Paul A. Zimmerman; Chris van Peski; Bryan Rice; Jeff Byers; Nicholas J. Turro; Xuegong Lei; Juan López-Gejo; Vladimir Liberman; Steve Palmacci; Mordy Rothchild; Andrew Whitker; Idriss Blakey; Lan Chen; Bronwin Dargaville; Heping Liu

Title:
Status of High-Index Materials for Generation-Three 193nm Immersion Lithography
Author(s):
Zimmerman, Paul A.
Peski, Chris van
Rice, Bryan
Byers, Jeff
Turro, Nicholas J.
Lei, Xuegong
López-Gejo, Juan
Liberman, Vladimir
Palmacci, Steve
Rothchild, Mordy
Whitker, Andrew
Blakey, Idriss
Chen, Lan
Dargaville, Bronwin
Liu, Heping
Date:
Type:
Articles
Department:
Chemistry
Volume:
20
Permanent URL:
Book/Journal Title:
Journal of Photopolymer Science and Technology
Abstract:
Generation-three (Gen-3) immersion lithography can be an enabler for the 32nm half-pitch node. For Gen-3 lithography to be successful, however, there must be three major breakthroughs in materials development: high refractive index ("high-index") lenses, high-index immersion fluids, and high-index photo-resists. Currently a material for a high-index lens element, lutetium aluminum garnet (LuAG), has been identified. However, suitable materials choices remain elusive for both the Gen-3 fluid and resist. This paper reviews the successes and failures in the search for Gen-3 high-index materials.
Subject(s):
Chemistry
Item views:
403
Metadata:
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