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Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193 nm

Naphtali A. O'Connor; Vladimir Liberman; Xuegong Lei; Juan López-Gejo; Nicholas J. Turro; Paul A. Zimmerman

Title:
Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193 nm
Author(s):
O'Connor, Naphtali A.
Liberman, Vladimir
Lei, Xuegong
López-Gejo, Juan
Turro, Nicholas J.
Zimmerman, Paul A.
Date:
Type:
Articles
Department:
Chemistry
Volume:
21
Permanent URL:
Book/Journal Title:
Journal of Photopolymer Science and Technology
Abstract:
The search for successful generation 3 immersion lithography fluids is focused on high refractive index fluids which are transparent to 193 nm light. This search has led to saturated hydrocarbons which have been shown potential in this field. This paper discusses our observations that many immersion fluid candidates (saturated hydrocarbons and acetonitrile) were observed to polymerize upon irradiation with 193 nm light.
Subject(s):
Chemistry
Item views:
167
Metadata:
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