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Development and Evaluation of a 193nm Immersion Generation-Three Fluid Candidates

Paul A. Zimmerman; Jeff Byers; Bryan Rice; Christopher K. Ober; Emmanuel P. Giannelis; Robert Rodriguez; Dongyan Wang; Naphtali O'Connor; Xuegong Lei; Nicholas J. Turro; Vladimir Liberman; Stephen Palmacci; Mordechai Rothschild; Neal Lafferty; Bruce W. Smith

Title:
Development and Evaluation of a 193nm Immersion Generation-Three Fluid Candidates
Author(s):
Zimmerman, Paul A.
Byers, Jeff
Rice, Bryan
Ober, Christopher K.
Giannelis, Emmanuel P.
Rodriguez, Robert
Wang, Dongyan
O'Connor, Naphtali
Lei, Xuegong
Turro, Nicholas J.
Liberman, Vladimir
Palmacci, Stephen
Rothschild, Mordechai
Lafferty, Neal
Smith, Bruce W.
Date:
Type:
Articles
Department:
Chemistry
Volume:
6923
Permanent URL:
Book/Journal Title:
Proceedings of SPIE
Abstract:
The need to extend 193nm immersion lithography necessitates the development of a third generation (Gen-3) of high refractive index (RI) fluids that will enable approximately 1.7 numerical aperture (NA) imaging. A multi-pronged approach was taken to develop these materials. One approach investigated the highest-index organic thus far discovered. The second approach used a very high refractive index nanoparticle to make a nanocomposite fluid. This report will describe the chemistry of the best Gen-3 fluid candidates and the systematic approach to their identification and synthesis. Images obtained with the Gen-3 fluid candidates will also be presented for a NA ≥ 1.7.
Subject(s):
Chemistry
Publisher DOI:
10.1117/12.772887
Item views:
265
Metadata:
text | xml

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