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Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography

Adam J. Berro; Xinyu Gu; Naphtali O'Connor; Steffen Jockusch; Tomoki Nagai; Toshiyuki Ogata; Paul Zimmerman; Bryan J. Rice; Elizabeth Adolph; Travis Byargeon; Jose Gonzalez; Nicholas J. Turro; C. Grant Willson

Title:
Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography
Author(s):
Berro, Adam J.
Gu, Xinyu
O'Connor, Naphtali
Jockusch, Steffen
Nagai, Tomoki
Ogata, Toshiyuki
Zimmerman, Paul
Rice, Bryan J.
Adolph, Elizabeth
Byargeon, Travis
Gonzalez, Jose
Turro, Nicholas J.
Willson, C. Grant
Date:
Type:
Articles
Department:
Chemistry
Volume:
7273
Permanent URL:
Book/Journal Title:
Proceedings of SPIE
Abstract:
Intermediate state two-photon (ISTP) photoacid generator (PAG) and optical threshold layer (OTL) approaches to double exposure lithography have been explored. We have synthesized "transparent" PAG and sensitizer compounds for use in ISTP systems and have demonstrated the possibility of utilizing such energy transfer systems to generate acid. We have also synthesized side chain liquid crystalline polymers and small molecule azobenzene compounds for use in OTL applications and have begun photoswitching studies.
Subject(s):
Chemistry
Publisher DOI:
10.1117/12.814295
Item views:
226
Metadata:
text | xml

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