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Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography

Xinyu Gu; Adam J. Berro; Younjin Cho; Kane Jen; Saul Lee; Tomoki Nagai; Toshiyuki Ogata; William J. Durand; Arun K. Sundaresan; Jeffrey R. Lancaster; Steffen Jockusch; Paul Zimmerman; Nicholas J. Turro; C. Grant Willson

Title:
Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography
Author(s):
Gu, Xinyu
Berro, Adam J.
Cho, Younjin
Jen, Kane
Lee, Saul
Nagai, Tomoki
Ogata, Toshiyuki
Durand, William J.
Sundaresan, Arun K.
Lancaster, Jeffrey R.
Jockusch, Steffen
Zimmerman, Paul
Turro, Nicholas J.
Willson, C. Grant
Date:
Type:
Articles
Department:
Chemistry
Volume:
7273
Permanent URL:
Book/Journal Title:
Proceedings of SPIE
Abstract:
Intermediate state two-photon (ISTP) photoacid generator (PAG) and optical threshold layer (OTL) approaches to double exposure lithography have been explored. We have synthesized "transparent" PAG and sensitizer compounds for use in ISTP systems and have demonstrated the possibility of utilizing such energy transfer systems to generate acid. We have also synthesized side chain liquid crystalline polymers and small molecule azobenzene compounds for use in OTL applications and have begun photoswitching studies.
Subject(s):
Chemistry
Publisher DOI:
http://dx.doi.org/10.1117/12.814298
Item views:
214
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