1. A 'Toolkit' of Small Molecules for Polymer Assembly and Post-Synthetic Modification Using 'Click' and Photoactive Chemistries Lancaster, Jeffrey R. 2011 Theses ChemistryPolymersChemical engineering
2. Solid phase modular synthesis of polymacromer brushes and their isolation as molecular products by photocleavage from the substrate Dach, Benjamin Isaac; Li, Xia; Turro, Nicholas J.; Koberstein, Jeffrey T. 2011 Articles ChemistryChemical engineering
3. Adiabatic ring opening in tethered naphthalene and anthracene cycloadducts Sundaresan, Arun K.; Jockusch, Steffen; Li, Yongjun; Lancaster, Jeffrey R.; Banik, Steven; Zimmerman, Paul; Blackwell, James M.; Bristol, Robert; Turro, Nicholas J. 2010 Articles ChemistryChemical engineering
4. A covalently linked phenanthridine-ruthenium(II) complex as a RNA probe O'Connor, Naphtali A.; Stevens, Nathan; Samaroo, Diana; Solomon, Marissa Rowanda; Martí, Angel A.; Dyer, Joanne; Vishwasrao, Harshad; Akins, Daniel L.; Kandel, Eric; Turro, Nicholas J. 2009 Articles ChemistryChemical engineering
5. A New Materials-based Pitch Division Technique Gu, Xinyu; Bates, Christopher; Cho, Younjin; Costner, Elizabeth; Marzuka, Fernando; Nagai, Tomoki; Ogata, Toshiyuki; Shi, Chuan; Sundaresan, Arun K.; Turro, Nicholas J.; Bristol, Robert; Zimmerman, Paul; Willson, C. Grant 2009 Articles ChemistryChemical engineering
6. Coupled translation-rotation eigenstates of H2 in C60 and C70 on the spectroscopically optimized interaction potential: Effects of cage anisotropy on the energy level structure and assignments Xu, Minzhong; Sebastianelli, Francesco; Gibbons, Brittney R.; Bačić, Zlatko; Lawler, Ronald; Turro, Nicholas J. 2009 Articles Chemical engineeringChemistry
7. Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography Gu, Xinyu; Berro, Adam J.; Cho, Younjin; Jen, Kane; Lee, Saul; Nagai, Tomoki; Ogata, Toshiyuki; Durand, William J.; Sundaresan, Arun K.; Lancaster, Jeffrey R.; Jockusch, Steffen; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant 2009 Articles ChemistryChemical engineering
8. Materials modeling and development for use in double-exposure lithography applications Lee, Saul; Jen, Kane; Willson, C. Grant; Byers, Jeffrey; Zimmerman, Paul; Turro, Nicholas J. 2009 Articles ChemistryChemical engineering
9. Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography Berro, Adam J.; Gu, Xinyu; O'Connor, Naphtali; Jockusch, Steffen; Nagai, Tomoki; Ogata, Toshiyuki; Zimmerman, Paul; Rice, Bryan J.; Adolph, Elizabeth; Byargeon, Travis; Gonzalez, Jose; Turro, Nicholas J.; Willson, C. Grant 2009 Articles ChemistryChemical engineering
10. Physical and chemical quenching rates and their influence on stereoselective photooxygenation of oxazolidinone-functionalized enecarbamates Solomon, Marissa Rowanda; Sivaguru, J.; Adam, Waldemar; Jockusch, Steffen; Turro, Nicholas J. 2009 Articles ChemistryChemical engineering