1. Adiabatic ring opening in tethered naphthalene and anthracene cycloadducts Sundaresan, Arun K.; Jockusch, Steffen; Li, Yongjun; Lancaster, Jeffrey R.; Banik, Steven; Zimmerman, Paul; Blackwell, James M.; Bristol, Robert; Turro, Nicholas J. 2010 Articles ChemistryChemical engineering
2. A New Materials-based Pitch Division Technique Gu, Xinyu; Bates, Christopher; Cho, Younjin; Costner, Elizabeth; Marzuka, Fernando; Nagai, Tomoki; Ogata, Toshiyuki; Shi, Chuan; Sundaresan, Arun K.; Turro, Nicholas J.; Bristol, Robert; Zimmerman, Paul; Willson, C. Grant 2009 Articles ChemistryChemical engineering
3. Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography Gu, Xinyu; Berro, Adam J.; Cho, Younjin; Jen, Kane; Lee, Saul; Nagai, Tomoki; Ogata, Toshiyuki; Durand, William J.; Sundaresan, Arun K.; Lancaster, Jeffrey R.; Jockusch, Steffen; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant 2009 Articles ChemistryChemical engineering
4. Materials modeling and development for use in double-exposure lithography applications Lee, Saul; Jen, Kane; Willson, C. Grant; Byers, Jeffrey; Zimmerman, Paul; Turro, Nicholas J. 2009 Articles ChemistryChemical engineering
5. Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography Berro, Adam J.; Gu, Xinyu; O'Connor, Naphtali; Jockusch, Steffen; Nagai, Tomoki; Ogata, Toshiyuki; Zimmerman, Paul; Rice, Bryan J.; Adolph, Elizabeth; Byargeon, Travis; Gonzalez, Jose; Turro, Nicholas J.; Willson, C. Grant 2009 Articles ChemistryChemical engineering
6. An analysis of double exposure lithography options Lee, Saul; Byers, Jeffrey; Jen, Kane; Zimmerman, Paul; Rice, Bryan; Turro, Nicholas J.; Willson, C. Grant 2008 Articles ChemistryChemical engineering
7. Double Exposure Materials: Simulation Study of Feasibility Byers, Jeffrey; Lee, Saul; Jen, Kane; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant 2007 Articles ChemistryChemical engineering
8. Methods for the synthesis and purification of polycycloalkane candidates for photolithography immersion fluids at 193 nm: requirements for removal of oxygen López-Gejo, Juan; Kunjappu, Joy T.; Conley, Will; Zimmerman, Paul; Turro, Nicholas J. 2007 Articles ChemistryChemical engineering
9. Outlook for potential third-generation immersion fluids López-Gejo, Juan; Kunjappu, Joy T.; Zhou, J.; Smith, Bruce W.; Zimmerman, Paul; Conley, Will; Turro, Nicholas J. 2007 Articles ChemistryChemical engineering
10. Amplification of the Index of Refraction of Aqueous Immersion Fluids by Ionic Surfactants Lee, Kwangjoo; Kunjappu, Joy T.; Jockusch, Steffen; Turro, Nicholas J.; Widerschpan, Tatjana; Zhou, Jianming; Smith, Bruce W.; Zimmerman, Paul; Conley, Will 2005 Articles ChemistryChemical engineering