1. Solid phase modular synthesis of polymacromer brushes and their isolation as molecular products by photocleavage from the substrate Dach, Benjamin Isaac; Li, Xia; Turro, Nicholas J.; Koberstein, Jeffrey T. 2011 Articles ChemistryChemical engineering
2. Adiabatic ring opening in tethered naphthalene and anthracene cycloadducts Sundaresan, Arun K.; Jockusch, Steffen; Li, Yongjun; Lancaster, Jeffrey R.; Banik, Steven; Zimmerman, Paul; Blackwell, James M.; Bristol, Robert; Turro, Nicholas J. 2010 Articles ChemistryChemical engineering
3. A covalently linked phenanthridine-ruthenium(II) complex as a RNA probe O'Connor, Naphtali A.; Stevens, Nathan; Samaroo, Diana; Solomon, Marissa Rowanda; Martí, Angel A.; Dyer, Joanne; Vishwasrao, Harshad; Akins, Daniel L.; Kandel, Eric; Turro, Nicholas J. 2009 Articles ChemistryChemical engineering
4. A New Materials-based Pitch Division Technique Gu, Xinyu; Bates, Christopher; Cho, Younjin; Costner, Elizabeth; Marzuka, Fernando; Nagai, Tomoki; Ogata, Toshiyuki; Shi, Chuan; Sundaresan, Arun K.; Turro, Nicholas J.; Bristol, Robert; Zimmerman, Paul; Willson, C. Grant 2009 Articles ChemistryChemical engineering
5. Coupled translation-rotation eigenstates of H2 in C60 and C70 on the spectroscopically optimized interaction potential: Effects of cage anisotropy on the energy level structure and assignments Xu, Minzhong; Sebastianelli, Francesco; Gibbons, Brittney R.; Bačić, Zlatko; Lawler, Ronald; Turro, Nicholas J. 2009 Articles Chemical engineeringChemistry
6. Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography Gu, Xinyu; Berro, Adam J.; Cho, Younjin; Jen, Kane; Lee, Saul; Nagai, Tomoki; Ogata, Toshiyuki; Durand, William J.; Sundaresan, Arun K.; Lancaster, Jeffrey R.; Jockusch, Steffen; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant 2009 Articles ChemistryChemical engineering
7. Materials modeling and development for use in double-exposure lithography applications Lee, Saul; Jen, Kane; Willson, C. Grant; Byers, Jeffrey; Zimmerman, Paul; Turro, Nicholas J. 2009 Articles ChemistryChemical engineering
8. Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography Berro, Adam J.; Gu, Xinyu; O'Connor, Naphtali; Jockusch, Steffen; Nagai, Tomoki; Ogata, Toshiyuki; Zimmerman, Paul; Rice, Bryan J.; Adolph, Elizabeth; Byargeon, Travis; Gonzalez, Jose; Turro, Nicholas J.; Willson, C. Grant 2009 Articles ChemistryChemical engineering
9. Physical and chemical quenching rates and their influence on stereoselective photooxygenation of oxazolidinone-functionalized enecarbamates Solomon, Marissa Rowanda; Sivaguru, J.; Adam, Waldemar; Jockusch, Steffen; Turro, Nicholas J. 2009 Articles ChemistryChemical engineering
10. Polyurethane Nanocomposites Khudyakov, Igor V.; Zopf, R. David; Turro, Nicholas J. 2009 Articles ChemistryChemical engineering