1. Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193 nm O'Connor, Naphtali A.; Liberman, Vladimir; Lei, Xuegong; López-Gejo, Juan; Turro, Nicholas J.; Zimmerman, Paul A. 2008 Articles ChemistryChemical engineering
2. Development and Evaluation of a 193nm Immersion Generation-Three Fluid Candidates Zimmerman, Paul A.; Byers, Jeff; Rice, Bryan; Ober, Christopher K.; Giannelis, Emmanuel P.; Rodriguez, Robert; Wang, Dongyan; O'Connor, Naphtali; Lei, Xuegong; Turro, Nicholas J.; Liberman, Vladimir; Palmacci, Stephen; Rothschild, Mordechai; Lafferty, Neal; Smith, Bruce W. 2008 Articles ChemistryChemical engineering
3. Status of High-Index Materials for Generation-Three 193nm Immersion Lithography Zimmerman, Paul A.; Peski, Chris van; Rice, Bryan; Byers, Jeff; Turro, Nicholas J.; Lei, Xuegong; López-Gejo, Juan; Liberman, Vladimir; Palmacci, Steve; Rothchild, Mordy; Whitker, Andrew; Blakey, Idriss; Chen, Lan; Dargaville, Bronwin; Liu, Heping 2007 Articles ChemistryChemical engineering
4. In situ EPR investigation of the addition of persistent benzyl radicals to acrylates on ZSM-5 zeolites. Direct spectroscopic detection of the initial steps in a supramolecular photopolymerization Lei, Xuegong; Jockusch, Steffen; Ottaviani, M. Francesca; Turro, Nicholas J. 2003 Articles ChemistryChemical engineering
5. Photochemistry and magnetic resonance spectroscopy as probes of supramolecular structures and migration pathways of organic molecules and radicals adsorbed on zeolites Turro, Nicholas J.; Lei, Xuegong; Li, Wei; McDermott, Ann E.; Abrams, Lloyd; Ottavianai, M. Francesca; Beard, Hege Støgård 1998 Articles ChemistryChemical engineering
6. Photochemistry of ketones adsorbed on size/shape selective zeolites. A supramolecular approach to persistent carbon centered radicals Turro, Nicholas J.; McDermott, Ann E.; Lei, Xuegong; Li, Wei; Abrams, Lloyd; Ottavianai, M. Francesca; Beard, Hege Støgård; Houk, Kendall N.; Beno, Brett R.; Lee, Patrick S. 1998 Articles ChemistryChemical engineering