1. Photochemistry and magnetic resonance spectroscopy as probes of supramolecular structures and migration pathways of organic molecules and radicals adsorbed on zeolites Turro, Nicholas J.; Lei, Xuegong; Li, Wei; McDermott, Ann E.; Abrams, Lloyd; Ottavianai, M. Francesca; Beard, Hege Støgård 1998 Articles ChemistryChemical engineering
2. Photochemistry of ketones adsorbed on size/shape selective zeolites. A supramolecular approach to persistent carbon centered radicals Turro, Nicholas J.; McDermott, Ann E.; Lei, Xuegong; Li, Wei; Abrams, Lloyd; Ottavianai, M. Francesca; Beard, Hege Støgård; Houk, Kendall N.; Beno, Brett R.; Lee, Patrick S. 1998 Articles ChemistryChemical engineering
3. In situ EPR investigation of the addition of persistent benzyl radicals to acrylates on ZSM-5 zeolites. Direct spectroscopic detection of the initial steps in a supramolecular photopolymerization Lei, Xuegong; Jockusch, Steffen; Ottaviani, M. Francesca; Turro, Nicholas J. 2003 Articles ChemistryChemical engineering
4. Status of High-Index Materials for Generation-Three 193nm Immersion Lithography Zimmerman, Paul A.; Peski, Chris van; Rice, Bryan; Byers, Jeff; Turro, Nicholas J.; Lei, Xuegong; López-Gejo, Juan; Liberman, Vladimir; Palmacci, Steve; Rothchild, Mordy; Whitker, Andrew; Blakey, Idriss; Chen, Lan; Dargaville, Bronwin; Liu, Heping 2007 Articles ChemistryChemical engineering
5. Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193 nm O'Connor, Naphtali A.; Liberman, Vladimir; Lei, Xuegong; López-Gejo, Juan; Turro, Nicholas J.; Zimmerman, Paul A. 2008 Articles ChemistryChemical engineering
6. Development and Evaluation of a 193nm Immersion Generation-Three Fluid Candidates Zimmerman, Paul A.; Byers, Jeff; Rice, Bryan; Ober, Christopher K.; Giannelis, Emmanuel P.; Rodriguez, Robert; Wang, Dongyan; O'Connor, Naphtali; Lei, Xuegong; Turro, Nicholas J.; Liberman, Vladimir; Palmacci, Stephen; Rothschild, Mordechai; Lafferty, Neal; Smith, Bruce W. 2008 Articles ChemistryChemical engineering