1. Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography Gu, Xinyu; Berro, Adam J.; Cho, Younjin; Jen, Kane; Lee, Saul; Nagai, Tomoki; Ogata, Toshiyuki; Durand, William J.; Sundaresan, Arun K.; Lancaster, Jeffrey R.; Jockusch, Steffen; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant 2009 Articles ChemistryChemical engineering
2. Materials modeling and development for use in double-exposure lithography applications Lee, Saul; Jen, Kane; Willson, C. Grant; Byers, Jeffrey; Zimmerman, Paul; Turro, Nicholas J. 2009 Articles ChemistryChemical engineering
3. An analysis of double exposure lithography options Lee, Saul; Byers, Jeffrey; Jen, Kane; Zimmerman, Paul; Rice, Bryan; Turro, Nicholas J.; Willson, C. Grant 2008 Articles ChemistryChemical engineering
4. Double Exposure Materials: Simulation Study of Feasibility Byers, Jeffrey; Lee, Saul; Jen, Kane; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant 2007 Articles ChemistryChemical engineering