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1. Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography

: Gu, Xinyu; Berro, Adam J.; Cho, Younjin; Jen, Kane; Lee, Saul; Nagai, Tomoki; Ogata, Toshiyuki; Durand, William J.; Sundaresan, Arun K.; Lancaster, Jeffrey R.; Jockusch, Steffen; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant
: 2009
: Articles
: ChemistryChemical engineering

2. Materials modeling and development for use in double-exposure lithography applications

: Lee, Saul; Jen, Kane; Willson, C. Grant; Byers, Jeffrey; Zimmerman, Paul; Turro, Nicholas J.
: 2009
: Articles
: ChemistryChemical engineering

3. An analysis of double exposure lithography options

: Lee, Saul; Byers, Jeffrey; Jen, Kane; Zimmerman, Paul; Rice, Bryan; Turro, Nicholas J.; Willson, C. Grant
: 2008
: Articles
: ChemistryChemical engineering

4. Double Exposure Materials: Simulation Study of Feasibility

: Byers, Jeffrey; Lee, Saul; Jen, Kane; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant
: 2007
: Articles
: ChemistryChemical engineering