Zimmerman Paul A. author Byers Jeff author Rice Bryan author Ober Christopher K. author Giannelis Emmanuel P. author Rodriguez Robert author Wang Dongyan author O'Connor Naphtali author Columbia University. Chemistry Lei Xuegong author Columbia University. Chemistry Turro Nicholas J. author Columbia University. Chemistry Columbia University. Chemical Engineering Columbia University. Earth and Environmental Engineering Liberman Vladimir author Palmacci Stephen author Rothschild Mordechai author Lafferty Neal author Smith Bruce W. author Columbia University. Chemistry originator text Articles 2008 English The need to extend 193nm immersion lithography necessitates the development of a third generation (Gen-3) of high refractive index (RI) fluids that will enable approximately 1.7 numerical aperture (NA) imaging. A multi-pronged approach was taken to develop these materials. One approach investigated the highest-index organic thus far discovered. The second approach used a very high refractive index nanoparticle to make a nanocomposite fluid. This report will describe the chemistry of the best Gen-3 fluid candidates and the systematic approach to their identification and synthesis. Images obtained with the Gen-3 fluid candidates will also be presented for a NA ≥ 1.7. Chemistry 6923 69230A-1 69230A-10 2008 10.1117/12.772887 http://hdl.handle.net/10022/AC:P:9350 NNC NNC 2010-07-22 14:19:03 -0400 2011-10-07 14:44:28 -0400 1837 eng