Start Search Over

Active Search Criteria:

Displaying items 31 - 40 of 99
sorted by

31 A New Materials-based Pitch Division Technique

Author(s):
Gu, Xinyu; Bates, Christopher; Cho, Younjin; Costner, Elizabeth; Marzuka, Fernando; Nagai, Tomoki; Ogata, Toshiyuki; Shi, Chuan; Sundaresan, Arun K.; Turro, Nicholas J.; Bristol, Robert; Zimmerman, Paul; Willson, C. Grant
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9397

32 Coupled translation-rotation eigenstates of H2 in C60 and C70 on the spectroscopically optimized interaction potential: Effects of cage anisotropy on the energy level structure and assignments

Author(s):
Xu, Minzhong; Sebastianelli, Francesco; Gibbons, Brittney R.; Bačić, Zlatko; Lawler, Ronald; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8603

33 Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography

Author(s):
Gu, Xinyu; Berro, Adam J.; Cho, Younjin; Jen, Kane; Lee, Saul; Nagai, Tomoki; Ogata, Toshiyuki; Durand, William J.; Sundaresan, Arun K.; Lancaster, Jeffrey R.; Jockusch, Steffen; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9348

34 Materials modeling and development for use in double-exposure lithography applications

Author(s):
Lee, Saul; Jen, Kane; Willson, C. Grant; Byers, Jeffrey; Zimmerman, Paul; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9347

35 Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography

Author(s):
Berro, Adam J.; Gu, Xinyu; O'Connor, Naphtali; Jockusch, Steffen; Nagai, Tomoki; Ogata, Toshiyuki; Zimmerman, Paul; Rice, Bryan J.; Adolph, Elizabeth; Byargeon, Travis; Gonzalez, Jose; Turro, Nicholas J.; Willson, C. Grant
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9349

36 Physical and chemical quenching rates and their influence on stereoselective photooxygenation of oxazolidinone-functionalized enecarbamates

Author(s):
Solomon, Marissa Rowanda; Sivaguru, J.; Adam, Waldemar; Jockusch, Steffen; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8596

37 Polyurethane Nanocomposites

Author(s):
Khudyakov, Igor V.; Zopf, R. David; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9367

38 Probing the photoreactivity of aryl chlorides with oxygen

Author(s):
José P. da, Silva; Jockusch, Steffen; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8595

39 Shedding light on surfaces—using photons to transform and pattern material surfaces

Author(s):
Park, Ellane J.; Carroll, Gregory T.; Turro, Nicholas J.; Koberstein, Jeffrey T.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8594

40 An analysis of double exposure lithography options

Author(s):
Lee, Saul; Byers, Jeffrey; Jen, Kane; Zimmerman, Paul; Rice, Bryan; Turro, Nicholas J.; Willson, C. Grant
Date:
2008
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9351

Powered by the Center for Digital Research and Scholarship at Columbia University Libraries/Information Services.