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11 Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography

Author(s):
Berro, Adam J.; Gu, Xinyu; O'Connor, Naphtali; Jockusch, Steffen; Nagai, Tomoki; Ogata, Toshiyuki; Zimmerman, Paul; Rice, Bryan J.; Adolph, Elizabeth; Byargeon, Travis; Gonzalez, Jose; Turro, Nicholas J.; Willson, C. Grant
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9349

12 Physical and chemical quenching rates and their influence on stereoselective photooxygenation of oxazolidinone-functionalized enecarbamates

Author(s):
Solomon, Marissa Rowanda; Sivaguru, J.; Adam, Waldemar; Jockusch, Steffen; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8596

13 Polyurethane Nanocomposites

Author(s):
Khudyakov, Igor V.; Zopf, R. David; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9367

14 Probing the photoreactivity of aryl chlorides with oxygen

Author(s):
José P. da, Silva; Jockusch, Steffen; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8595

15 Shedding light on surfaces—using photons to transform and pattern material surfaces

Author(s):
Park, Ellane J.; Carroll, Gregory T.; Turro, Nicholas J.; Koberstein, Jeffrey T.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8594

16 An analysis of double exposure lithography options

Author(s):
Lee, Saul; Byers, Jeffrey; Jen, Kane; Zimmerman, Paul; Rice, Bryan; Turro, Nicholas J.; Willson, C. Grant
Date:
2008
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9351

17 Copper-free click chemistry for the in situ crosslinking of photodegradable star polymers

Author(s):
Johnson, Jeremiah; Baskin, Jeremy M.; Bertozzi, Carolyn R.; Koberstein, Jeffrey T.; Turro, Nicholas J.
Date:
2008
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8599

18 Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193 nm

Author(s):
O'Connor, Naphtali A.; Liberman, Vladimir; Lei, Xuegong; López-Gejo, Juan; Turro, Nicholas J.; Zimmerman, Paul A.
Date:
2008
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9355

19 Development and Evaluation of a 193nm Immersion Generation-Three Fluid Candidates

Author(s):
Zimmerman, Paul A.; Byers, Jeff; Rice, Bryan; Ober, Christopher K.; Giannelis, Emmanuel P.; Rodriguez, Robert; Wang, Dongyan; O'Connor, Naphtali; Lei, Xuegong; Turro, Nicholas J.; Liberman, Vladimir; Palmacci, Stephen; Rothschild, Mordechai; Lafferty, Neal; Smith, Bruce W.
Date:
2008
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9350

20 Dynamic properties and optical phase conjugation of two-photon pumped ultrashort blue stimulated emission in a chromophore solution

Author(s):
He, Guang S.; Qin, Hai-Yan; Zheng, Qingdong; Prasad, Paras N.; Jockusch, Steffen; Turro, Nicholas J.; Halim, Marlin; Sames, Dalibor; Ã…gren, Hans; He, Sailing
Date:
2008
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:8607

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