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1 Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193 nm

Author(s):
O'Connor, Naphtali A.; Liberman, Vladimir; Lei, Xuegong; López-Gejo, Juan; Turro, Nicholas J.; Zimmerman, Paul A.
Date:
2008
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9355

2 Amplification of the index of refraction of aqueous immersion fluids with crown ethers

Author(s):
López-Gejo, Juan; Kunjappu, Joy T.; Turro, Nicholas J.; Conley, Will
Date:
2007
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9358

3 Methods for the synthesis and purification of polycycloalkane candidates for photolithography immersion fluids at 193 nm: requirements for removal of oxygen

Author(s):
López-Gejo, Juan; Kunjappu, Joy T.; Conley, Will; Zimmerman, Paul; Turro, Nicholas J.
Date:
2007
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9359

4 Outlook for potential third-generation immersion fluids

Author(s):
López-Gejo, Juan; Kunjappu, Joy T.; Zhou, J.; Smith, Bruce W.; Zimmerman, Paul; Conley, Will; Turro, Nicholas J.
Date:
2007
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9352

5 Status of High-Index Materials for Generation-Three 193nm Immersion Lithography

Author(s):
Zimmerman, Paul A.; Peski, Chris van; Rice, Bryan; Byers, Jeff; Turro, Nicholas J.; Lei, Xuegong; López-Gejo, Juan; Liberman, Vladimir; Palmacci, Steve; Rothchild, Mordy; Whitker, Andrew; Blakey, Idriss; Chen, Lan; Dargaville, Bronwin; Liu, Heping
Date:
2007
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9356

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