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1 Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography

Author(s):
Gu, Xinyu; Berro, Adam J.; Cho, Younjin; Jen, Kane; Lee, Saul; Nagai, Tomoki; Ogata, Toshiyuki; Durand, William J.; Sundaresan, Arun K.; Lancaster, Jeffrey R.; Jockusch, Steffen; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9348

2 Materials modeling and development for use in double-exposure lithography applications

Author(s):
Lee, Saul; Jen, Kane; Willson, C. Grant; Byers, Jeffrey; Zimmerman, Paul; Turro, Nicholas J.
Date:
2009
Subject:
Chemistry
Content Type:
Articles
Permanent URL:
http://hdl.handle.net/10022/AC:P:9347

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